• Osstem Implant®

    Osstem Implant®-TSIII

    M Ø3.5R Ø4.0

gerade CoCr Base compatible with Osstem Implant®-TSIII

Description

Gerades gießbares Abutment mit maschinell bearbeiteter Co-Cr-Basis zum Gießen.

Reusable

No

  Reference Configuration Platform
IPD/OB-BN-00EngagingEngagingEngagingM Ø3.5M Ø3.5
IPD/OB-BN-01M Ø3.5M Ø3.5
IPD/OB-BR-00EngagingEngagingEngagingR Ø4.0
IPD/OB-BR-01R Ø4.0