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Dio®
Dio® -UFII
NP (N)RP (R)
gerade CoCr Base compatible with Dio® -UFII
Description
Gerades gießbares Abutment mit maschinell bearbeiteter Co-Cr-Basis zum Gießen.
Reusable
No
| Reference | Configuration | Platform | |||
|---|---|---|---|---|---|
| IPD/UB-BN-00 | Engaging | Engaging | NP (N) | NP (N) | |
| IPD/UB-BN-01 | |||||
| IPD/UB-BR-00 | Engaging | Engaging | RP (R) | ||
| IPD/UB-BR-01 | RP (R) |
